Microscope for use on vacuum and process chambers
High resolution on long working distances
Our microscope allows to observe samples and processes in a (vacuum) chamber in situ with a resolution of 1 micrometer. The lens is attached to a viewport on the outside, so it does not protrude into the chamber. The object to be observed may be positioned at a distance up to 100 mm from the viewport.
In addition to imaging, various spectroscopic methods in the wavelength range from 200 to 2000 nm can be applied.
Typical applications are thin films (MBE/OMBE, CVD/PVD), laser structuring, micro-3D printing, LED/OLED, microsystems and nanotechnology.
Mikroscope objektiv lens 10x/0.25 with 100 mm working distance
The 10x magnification lens provides very good imaging performance over the entire wavelength range from 200 nm to 2000 nm. It is diffraction limited above 400 nm, and with its numerical aperture of 0.25 achieves a resolution of 1 micrometer.
The optical design of mirrors and lenses (catadioptric system) takes into account the vacuum window of the viewport. This unique feature allows realization of the high resolution and an object field of 2 mm over a large wavelength range without refocusing.
Reflected Light Microscopy, Fluorescence, Hyperspectral Imaging
Likewise possible is the coupling of light sources for fluorescence or Raman excitation. By using a LASER, high localized excitation intensities are possible.
Alternatively, fiber-coupled illumination can also be used. In combination with our Monochromators, this makes hyperspectral imaging possible.
Customizing with standard components
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Phone: +49 (0)551 200 192 60
|Working distance||100.0 mm|
|Object field diameter||2.0 mm|
|Image diameter||20.0 mm|
|Resolution||1µm @ 405nm|
|Wavelength range||0.2 µm – 2.0 µm|
|Transmission 0.25 µm – 2,0 µm||> 50 %|
|Distortion||< 0,5 %|