Resolution test targets from Technologie Manufaktur – produced with the best technology worldwide
All of our resolution test targets are made with high-precision e-beam lithography. The 10 x 10 mm² substrate consists of quartz, offering very broad spectral transmission (DUV-VIS-NIR). A chromium layer with high optical density is applied to the substrate.
The test structures are produced by ablation of the chromium layer, whereby structural sizes down to 100 nm are possible as a result of the e-beam process. At the same time, excellent dimensional tolerances and straightness of the structural edges are ensured. Through ablation of the chromium layer, the structures of the test slide are transparent, while the background is blocked by the remaining chromium layer.
The resolution test targets are embedded in a robust stainless steel support with a standard size of 75×25 mm². For use with a microscope objective a version in available with a 0.17 mm cover glass.
Down to 100 nm
OD6 @550 nm
190 nm – 2000 nm
from Technologie Manufaktur
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Resolution test target TC-RT01
With the TC-RT01 resolution test target, the resolution limit of a lens can be determined very easily and quickly in transmitted light. The simple arrangement of the line pattern groups along with size readings ensures intuitive handling. In addition, 5 pinholes allow characterization of any optical imaging errors.
•For resolution test target with transmitted light
• 59 line pattern groups: 7.5 – 3300 LP/mm
• 3300 LP/mm requires an immersion lens or UV light
• 5 pinholes (Ø 4.0 µm – 0.25 µm)
Preis: 1050 Euros plus sales tax
Siemens Star TC-RT02
The Siemens Star TC-RT02 resolution test target is especially suitable for microscope lenses of very high numerical aperture. Precision manufacturing of the segments in the centre of the 5 Siemens Stars allows a minimum width of 150 nm. Additional measuring and positioning marks facilitate exact adjustment.
- For microscope lenses with a very high numerical aperture (NA)
- 5 Siemens Stars
- Minimum width in centre: 150 nm
- Additional measuring and positioning marks
Preis: 1050 Euros, plus sales tax
Our TC-CB50 test target offers a checkerboard with 180×180 fields, each with a size of 50 x 50 µm², and is therefore especially suitable for testing image skew and image field curvature. Furthermore, the very sharp edges of the field allow you, for example, to determine the local image quality of a camera. With our Slanted-Edge software package you can determine modulation transfer functions (MTF).
• Testing image skew and image field curvature
• Determine local image quality
• Determine the MTF with our in-house software package
• Total size 9.0 x 9.0 mm²
• Fields: 50 x 50 µm² each
Preis: 950 Euros, plus sales tax
High-Tech from Technologie Manufaktur: Precision through e-beam lithography
In order to be able to test the resolution of high-end microscopes, resolution test targets must be able to show the smallest and most precise structures. This is not possible using conventional photo-lithographic means.
For this reason, in the manufacture of our resolution test targets we use state-of-the-art e-beam lithography. E-beam lithography is primarily used in the semiconductor industry. The individual structures are written onto the wafer with an electron beam.
Although this next-generation lithography takes longer and is more expensive, it allows incomparable precision in terms of structures.
Manufacturing with electron beam lithography must take place in a clean room, since even a few particles can disrupt the structuring of the chromium layer.
Your custom test target – manufactured with e-beam lithography
We manufacture a test target optimally tailored to your optical production or your optical measurement device according to your own specifications.
Minimum order on request. We look forward to your project!